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Refinado por: Nome da Publicação: Journal Of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films remover
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11
Properties of (Ti1−x Al x )N coatings for cutting tools prepared by the cathodic arc ion plating method
Properties of (Ti1−x Al x )N coatings for cutting tools prepared by the cathodic arc ion plating method
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Properties of (Ti1−x Al x )N coatings for cutting tools prepared by the cathodic arc ion plating method

Tanaka, Y. ; Gür, T. M. ; Kelly, M. ; Hagstrom, S. B. ; Ikeda, T. ; Wakihira, K. ; Satoh, H.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1992-07, Vol.10 (4), p.1749-1756 [Periódico revisado por pares]

MELVILLE: A V S Amer Inst Physics

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12
Comparison of TiAlN coatings grown by unbalanced magnetron and arc bond sputtering techniques
Comparison of TiAlN coatings grown by unbalanced magnetron and arc bond sputtering techniques
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Comparison of TiAlN coatings grown by unbalanced magnetron and arc bond sputtering techniques

Münz, W.‐D. ; Hurkmans, T. ; Keiren, G. ; Trinh, T.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1993-09, Vol.11 (5), p.2583-2589 [Periódico revisado por pares]

Melville, NY: American Institute of Physics

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13
(Ti1−x Al x )N coatings by plasma‐enhanced chemical vapor deposition
(Ti1−x Al x )N coatings by plasma‐enhanced chemical vapor deposition
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(Ti1−x Al x )N coatings by plasma‐enhanced chemical vapor deposition

Lee, Sang‐Hyeob ; Ryoo, Ho‐Joon ; Lee, Jung‐Joong

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1994-07, Vol.12 (4), p.1602-1607 [Periódico revisado por pares]

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14
Multilayer, multicomponent, and multiphase physical vapor deposition coatings for enhanced performance
Multilayer, multicomponent, and multiphase physical vapor deposition coatings for enhanced performance
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Multilayer, multicomponent, and multiphase physical vapor deposition coatings for enhanced performance

Sproul, William D.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1994-07, Vol.12 (4), p.1595-1601 [Periódico revisado por pares]

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15
Compositionally gradient (Ti1−x Al x )N coatings made by plasma enhanced chemical vapor deposition
Compositionally gradient (Ti1−x Al x )N coatings made by plasma enhanced chemical vapor deposition
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Compositionally gradient (Ti1−x Al x )N coatings made by plasma enhanced chemical vapor deposition

Lee, Sang‐Hyeob ; Lee, Jung‐Joong

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1995-07, Vol.13 (4), p.2030-2034 [Periódico revisado por pares]

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16
Improvement of the cantilever beam technique for stress measurement during the physical vapor deposition process
Improvement of the cantilever beam technique for stress measurement during the physical vapor deposition process
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Improvement of the cantilever beam technique for stress measurement during the physical vapor deposition process

Moulard, G. ; Contoux, G. ; Motyl, G. ; Gardet, G. ; Courbon, M.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1998-03, Vol.16 (2), p.736-742 [Periódico revisado por pares]

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17
Structure, mechanical and tribological properties of Ti–B–N and Ti–Al–B–N multiphase thin films produced by electron-beam evaporation
Structure, mechanical and tribological properties of Ti–B–N and Ti–Al–B–N multiphase thin films produced by electron-beam evaporation
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Structure, mechanical and tribological properties of Ti–B–N and Ti–Al–B–N multiphase thin films produced by electron-beam evaporation

Rebholz, C. ; Ziegele, H. ; Leyland, A. ; Matthews, A.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1998-09, Vol.16 (5), p.2851-2857 [Periódico revisado por pares]

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18
High temperature oxidation of (Ti 1-X Al X ) N coatings made by plasma enhanced chemical vapor deposition
High temperature oxidation of (Ti 1-X Al X ) N coatings made by plasma enhanced chemical vapor deposition
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High temperature oxidation of (Ti 1-X Al X ) N coatings made by plasma enhanced chemical vapor deposition

Kim, Byoung-June ; Kim, Young-Cheol ; Nah, Jae-Woong ; Lee, Jung-Joong

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1999-01, Vol.17 (1), p.133-137 [Periódico revisado por pares]

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19
Microhardness and structural analysis of (Ti,Al)N, (Ti,Cr)N, (Ti,Zr)N and (Ti,V)N films
Microhardness and structural analysis of (Ti,Al)N, (Ti,Cr)N, (Ti,Zr)N and (Ti,V)N films
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Microhardness and structural analysis of (Ti,Al)N, (Ti,Cr)N, (Ti,Zr)N and (Ti,V)N films

Hasegawa, Hiroyuki ; Kimura, Ayako ; Suzuki, Tetsuya

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2000-05, Vol.18 (3), p.1038-1040 [Periódico revisado por pares]

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20
Microstructure and chemical state of Ti 1−x Y x N film deposited by reactive magnetron sputtering
Microstructure and chemical state of Ti 1−x Y x N film deposited by reactive magnetron sputtering
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Microstructure and chemical state of Ti 1−x Y x N film deposited by reactive magnetron sputtering

Choi, W. S. ; Hwang, S. K. ; Lee, C. M.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2000-11, Vol.18 (6), p.2914-2921 [Periódico revisado por pares]

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