Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Morphology and properties of sputtered (Ti,Al)N layers on high speed steel substrates as a function of deposition temperature and sputtering atmosphereJehn, Hermann A. ; Hofmann, Siegfried ; Rückborn, Vera‐Ellen ; Münz, Wolf‐DieterJournal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-11, Vol.4 (6), p.2701-2705 [Periódico revisado por pares]Texto completo disponível |
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Material Type: Artigo
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On structure and properties of sputtered Ti and Al based hard compound filmsKnotek, O. ; Böhmer, M. ; Leyendecker, T.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-11, Vol.4 (6), p.2695-2700 [Periódico revisado por pares]Texto completo disponível |
3 |
Material Type: Artigo
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Properties of (Ti1−x Al x )N coatings for cutting tools prepared by the cathodic arc ion plating methodTanaka, Y. ; Gür, T. M. ; Kelly, M. ; Hagstrom, S. B. ; Ikeda, T. ; Wakihira, K. ; Satoh, H.Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1992-07, Vol.10 (4), p.1749-1756 [Periódico revisado por pares]MELVILLE: A V S Amer Inst PhysicsTexto completo disponível |
4 |
Material Type: Artigo
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Deposition and properties of polycrystalline TiN/NbN superlattice coatingsChu, X. ; Wong, M. S. ; Sproul, W. D. ; Rohde, S. L. ; Barnett, S. A.Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1992-07, Vol.10 (4), p.1604-1609 [Periódico revisado por pares]WOODBURY: Amer Inst PhysicsTexto completo disponível |
5 |
Material Type: Artigo
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(Ti1−x Al x )N coatings by plasma‐enhanced chemical vapor depositionLee, Sang‐Hyeob ; Ryoo, Ho‐Joon ; Lee, Jung‐JoongJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1994-07, Vol.12 (4), p.1602-1607 [Periódico revisado por pares]Texto completo disponível |
6 |
Material Type: Artigo
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Multilayer, multicomponent, and multiphase physical vapor deposition coatings for enhanced performanceSproul, William D.Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1994-07, Vol.12 (4), p.1595-1601 [Periódico revisado por pares]Texto completo disponível |
7 |
Material Type: Artigo
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Compositionally gradient (Ti1−x Al x )N coatings made by plasma enhanced chemical vapor depositionLee, Sang‐Hyeob ; Lee, Jung‐JoongJournal of vacuum science & technology. A, Vacuum, surfaces, and films, 1995-07, Vol.13 (4), p.2030-2034 [Periódico revisado por pares]Texto completo disponível |
8 |
Material Type: Artigo
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Multilayered (Ti, Al) ceramic coating for high-speed machining applicationsZeng, X. T. ; Zhang, Sam ; Tan, L. S.Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2001-07, Vol.19 (4), p.1919-1922 [Periódico revisado por pares]Texto completo disponível |
9 |
Material Type: Artigo
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Plasma-enhanced chemical-vapor deposition of titanium aluminum carbonitride/amorphous-carbon nanocomposite thin filmsShieh, Jiann ; Hon, Min HsiungJournal of vacuum science & technology. A, Vacuum, surfaces, and films, 2002-01, Vol.20 (1), p.87-92 [Periódico revisado por pares]Texto completo disponível |
10 |
Material Type: Artigo
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Plasma-based physical vapor deposition surface engineering processesMatthews, AllanJournal of vacuum science & technology. A, Vacuum, surfaces, and films, 2003-09, Vol.21 (5), p.S224-S231 [Periódico revisado por pares]Texto completo disponível |