Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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11 |
Material Type: Artigo
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Electroplating of Cu(Ag) thin films for interconnect applicationsStrehle, S. ; Menzel, S. ; Bartha, J.W. ; Wetzig, K.Microelectronic engineering, 2010-02, Vol.87 (2), p.180-186 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
12 |
Material Type: Artigo
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Electrical Evaluation of Ru–W(-N), Ru–Ta(-N) and Ru–Mn films as Cu diffusion barriersWojcik, H. ; Kaltofen, R. ; Merkel, U. ; Krien, C. ; Strehle, S. ; Gluch, J. ; Knaut, M. ; Wenzel, C. ; Preusse, A. ; Bartha, J.W. ; Geidel, M. ; Adolphi, B. ; Neumann, V. ; Liske, R. ; Munnik, F.Microelectronic engineering, 2012-04, Vol.92, p.71-75 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
13 |
Material Type: Artigo
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Microstructure of electroplated Cu(Ag) alloy thin filmsStrehle, S. ; Menzel, S. ; Wetzig, K. ; Bartha, J.W.Thin solid films, 2011-03, Vol.519 (11), p.3522-3529 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
14 |
Material Type: Artigo
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Electromigration in electroplated Cu(Ag) alloy thin films investigated by means of single damascene Blech structuresStrehle, S. ; Menzel, S. ; Jahn, A. ; Merkel, U. ; Bartha, J.W. ; Wetzig, K.Microelectronic engineering, 2009-12, Vol.86 (12), p.2396-2403 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
15 |
Material Type: Artigo
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Top injection reactor tool with in situ spectroscopic ellipsometry for growth and characterization of ALD thin filmsSchmidt, D. ; Strehle, S. ; Albert, M. ; Hentsch, W. ; Bartha, J.W.Microelectronic engineering, 2008-03, Vol.85 (3), p.527-533 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
16 |
Material Type: Artigo
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Effect of Ag-alloying addition on the stress–temperature behavior of electroplated copper thin filmsMenzel, S. ; Strehle, S. ; Wendrock, H. ; Wetzig, K.Applied surface science, 2005-09, Vol.252 (1), p.211-214 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
17 |
Material Type: Artigo
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Modeling of residual stresses in thin films deposited by electron beam evaporationGuisbiers, G. ; Strehle, S. ; Wautelet, M.Microelectronic engineering, 2005-12, Vol.82 (3), p.665-669 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
18 |
Material Type: Artigo
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Investigation of organic impurities adsorbed on and incorporated into electroplated copper layersStangl, M. ; Dittel, V. ; Acker, J. ; Hoffmann, V. ; Gruner, W. ; Strehle, S. ; Wetzig, K.Applied surface science, 2005-09, Vol.252 (1), p.158-161 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
19 |
Material Type: Artigo
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Effect of wet chemical substrate pretreatment on the growth behavior of Ta(N) films deposited by thermal ALDStrehle, S. ; Schumacher, H. ; Schmidt, D. ; Knaut, M. ; Albert, M. ; Bartha, J.W.Microelectronic engineering, 2008-10, Vol.85 (10), p.2064-2067 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
20 |
Material Type: Artigo
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Microstructural investigation of electrodeposited CuAg-thin filmsStrehle, S. ; Menzel, S. ; Wendrock, H. ; Acker, J. ; Wetzig, K.Microelectronic engineering, 2003-11, Vol.70 (2), p.506-511 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |