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Refinado por: Nome da Publicação: Microelectronic Engineering remover Aerospace Database remover
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Defect-deformational self-organization and nanostructuring of solid surfaces
Defect-deformational self-organization and nanostructuring of solid surfaces
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Defect-deformational self-organization and nanostructuring of solid surfaces

Emel’yanov, V.I

Microelectronic engineering, 2003-09, Vol.69 (2), p.435-445 [Periódico revisado por pares]

Elsevier B.V

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2
Nanometer scale linewidth control during etching of polysilicon gates in high-density plasmas
Nanometer scale linewidth control during etching of polysilicon gates in high-density plasmas
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Nanometer scale linewidth control during etching of polysilicon gates in high-density plasmas

Joubert, O ; Pargon, E ; Foucher, J ; Detter, X ; Cunge, G ; Vallier, L

Microelectronic engineering, 2003-09, Vol.69 (2), p.350-357 [Periódico revisado por pares]

Elsevier B.V

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3
Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition
Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition
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Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition

Sundaram, K.B. ; Sah, R.E. ; Baumann, H. ; Balachandran, K. ; Todi, R.M.

Microelectronic engineering, 2003-10, Vol.70 (1), p.109-114 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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4
A concave-type structure of a Ru electrode capacitor fabricated by the reactive ion etching method
A concave-type structure of a Ru electrode capacitor fabricated by the reactive ion etching method
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A concave-type structure of a Ru electrode capacitor fabricated by the reactive ion etching method

Ju, Byong-Sun ; Kim, Hyoun Woo

Microelectronic engineering, 2003-10, Vol.70 (1), p.30-34 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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5
Wavelet analysis of directional variations of plasma etch profile
Wavelet analysis of directional variations of plasma etch profile
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Wavelet analysis of directional variations of plasma etch profile

Choi, Seok Rim ; Kim, Byungwhan ; Kim, Beom Soo ; Lee, Kyeong Kun

Microelectronic engineering, 2004, Vol.71 (1), p.1-6 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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6
Study on the etching damage characteristics of PZT thin films after etching in Cl-based plasma
Study on the etching damage characteristics of PZT thin films after etching in Cl-based plasma
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Study on the etching damage characteristics of PZT thin films after etching in Cl-based plasma

Kim, Kyoung-Tae ; Kang, Myoung-Gu ; Kim, Chang-Il

Microelectronic engineering, 2004-05, Vol.71 (3), p.294-300 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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7
Etching profile of silicon carbide in a NF3/CH4 inductively coupled plasma
Etching profile of silicon carbide in a NF3/CH4 inductively coupled plasma
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Etching profile of silicon carbide in a NF3/CH4 inductively coupled plasma

KIM, Byungwhan ; SUK YONG LEE ; LEE, Byung-Teak

Microelectronic engineering, 2004-05, Vol.71 (3-4), p.329-334 [Periódico revisado por pares]

Amsterdam: Elsevier Science

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8
Investigation of copper removal efficiency on reclaimed wafers with HF-based solutions
Investigation of copper removal efficiency on reclaimed wafers with HF-based solutions
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Investigation of copper removal efficiency on reclaimed wafers with HF-based solutions

Abbadie, A. ; Favier, S. ; Giroud, C. ; Billon, T.

Microelectronic engineering, 2004-05, Vol.71 (3), p.310-320 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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9
Fabrication of silicon nanopillar arrays and application on direct methanol fuel cell
Fabrication of silicon nanopillar arrays and application on direct methanol fuel cell
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Fabrication of silicon nanopillar arrays and application on direct methanol fuel cell

Tang, Yu-Hsiang ; Huang, Mao-Jung ; Shiao, Ming-Hua ; Yang, Chii-Rong

Microelectronic engineering, 2011-08, Vol.88 (8), p.2580-2583 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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10
Refractive index graded anti-reflection coating for solar cells based on low cost reclaimed silicon
Refractive index graded anti-reflection coating for solar cells based on low cost reclaimed silicon
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Refractive index graded anti-reflection coating for solar cells based on low cost reclaimed silicon

Liu, Yufei ; Guy, Owen James ; Patel, Jash ; Ashraf, Huma ; Knight, Nick

Microelectronic engineering, 2013-10, Vol.110, p.418-421 [Periódico revisado por pares]

Elsevier B.V

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