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Guiding the deposition flux in an ionized magnetron discharge
Guiding the deposition flux in an ionized magnetron discharge
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Guiding the deposition flux in an ionized magnetron discharge

Bohlmark, J. ; Östbye, M. ; Lattemann, M. ; Ljungcrantz, H. ; Rosell, T. ; Helmersson, U.

Thin solid films, 2006-12, Vol.515 (4), p.1928-1931 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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2
Glow discharge optical emission spectroscopy for accurate and well resolved analysis of coatings and thin films
Glow discharge optical emission spectroscopy for accurate and well resolved analysis of coatings and thin films
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Glow discharge optical emission spectroscopy for accurate and well resolved analysis of coatings and thin films

Wilke, Marcus ; Teichert, Gerd ; Gemma, Ryota ; Pundt, Astrid ; Kirchheim, Reiner ; Romanus, Henry ; Schaaf, Peter

Thin solid films, 2011-12, Vol.520 (5), p.1660-1667 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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3
Fabrication of enhancement-mode AlGaN/GaN high electron mobility transistors using double plasma treatment
Fabrication of enhancement-mode AlGaN/GaN high electron mobility transistors using double plasma treatment
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Fabrication of enhancement-mode AlGaN/GaN high electron mobility transistors using double plasma treatment

Lim, Jong-Won ; Ahn, Ho-Kyun ; Kim, Seong-il ; Kang, Dong-Min ; Lee, Jong-Min ; Min, Byoung-Gue ; Lee, Sang-Heung ; Yoon, Hyung-Sup ; Ju, Chull-Won ; Kim, Haecheon ; Mun, Jae-Kyoung ; Nam, Eun-Soo ; Park, Hyung-Moo

Thin solid films, 2013-11, Vol.547, p.106-110 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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4
Fabrication of Al doped ZnO films using atmospheric pressure cold plasma
Fabrication of Al doped ZnO films using atmospheric pressure cold plasma
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Fabrication of Al doped ZnO films using atmospheric pressure cold plasma

Suzaki, Yoshifumi ; Miyagawa, Hayato ; Yamaguchi, Kenzo ; Kim, Yoon-Kee

Thin solid films, 2012-11, Vol.522, p.324-329 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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5
Numerical investigation for nano-particle synthesis in an RF inductively coupled plasma
Numerical investigation for nano-particle synthesis in an RF inductively coupled plasma
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Numerical investigation for nano-particle synthesis in an RF inductively coupled plasma

Shigeta, Masaya ; Watanabe, Takayuki ; Nishiyama, Hideya

Thin solid films, 2004-06, Vol.457 (1), p.192-200 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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6
Precise etch-depth control of microlens-integrated intracavity contacted vertical-cavity surface-emitting lasers by in-situ laser reflectometry and reflectivity modeling
Precise etch-depth control of microlens-integrated intracavity contacted vertical-cavity surface-emitting lasers by in-situ laser reflectometry and reflectivity modeling
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Precise etch-depth control of microlens-integrated intracavity contacted vertical-cavity surface-emitting lasers by in-situ laser reflectometry and reflectivity modeling

Song, Y.M. ; Chang, K.S. ; Na, B.H. ; Yu, J.S. ; Lee, Y.T.

Thin solid films, 2009-08, Vol.517 (19), p.5773-5778 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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7
The etching characteristics of Al2O3 thin films in an inductively coupled plasma
The etching characteristics of Al2O3 thin films in an inductively coupled plasma
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The etching characteristics of Al2O3 thin films in an inductively coupled plasma

XUE-YANG ; UM, Doo-Seung ; KIM, Chang-Il

Thin solid films, 2010-09, Vol.518 (22), p.6441-6445 [Periódico revisado por pares]

Amsterdam: Elsevier

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8
Heating of polymer substrate by discharge plasma in radiofrequency magnetron sputtering deposition
Heating of polymer substrate by discharge plasma in radiofrequency magnetron sputtering deposition
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Heating of polymer substrate by discharge plasma in radiofrequency magnetron sputtering deposition

Sirghi, Lucel ; Popa, Gheorghe ; Hatanaka, Yoshinori

Thin solid films, 2006-12, Vol.515 (4), p.1334-1339 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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9
Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering
Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering
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Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering

PEDERSEN, K ; BØTTIGER, J ; SRIDHARAN, M ; SILLASSEN, M ; EKLUND, P

Thin solid films, 2010-05, Vol.518 (15), p.4294-4298 [Periódico revisado por pares]

Amsterdam: Elsevier

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10
High entropy alloy thin films deposited by magnetron sputtering of powder targets
High entropy alloy thin films deposited by magnetron sputtering of powder targets
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High entropy alloy thin films deposited by magnetron sputtering of powder targets

Braeckman, B.R. ; Boydens, F. ; Hidalgo, H. ; Dutheil, P. ; Jullien, M. ; Thomann, A.-L. ; Depla, D.

Thin solid films, 2015-04, Vol.580, p.71-76 [Periódico revisado por pares]

Elsevier B.V

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