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1
On the Variability of the Front-/Back-Channel LF Noise in UTBOX SOI nMOSFETs
On the Variability of the Front-/Back-Channel LF Noise in UTBOX SOI nMOSFETs
Material Type:
Artigo 		Adicionar ao Meu Espaço

On the Variability of the Front-/Back-Channel LF Noise in UTBOX SOI nMOSFETs

Sara Dereste dos Santos Talitha Nicoletti; João Antonio Martino 1959-; Marc Aoulaiche; Anabela Veloso; Malgorzata Jurczak; Eddy Simoen; Cor Claeys

IEEE Transactions on Electron Devices v. 60, n. 1, p. 444-450, Jan 2013

2013

Item não circula. Consulte sua biblioteca.(Acessar)

2
Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation
Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation
Material Type:
Artigo 		Adicionar ao Meu Espaço

Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation

Talitha Nicoletti Sara Dereste dos Santos; João Antonio Martino 1959-; Marc Aoulaiche; Anabela Veloso; Cor Claeys; Eddy Simoen; Malgorzata Jurczak

Solid-State Electronics v. 91, p. 53-58, Jan 2014

2014

Item não circula. Consulte sua biblioteca.(Acessar)

3
The impact of gate length scaling on UTBOX FDSOI devices the digital/analog performance of extension-less structures
The impact of gate length scaling on UTBOX FDSOI devices the digital/analog performance of extension-less structures
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

The impact of gate length scaling on UTBOX FDSOI devices the digital/analog performance of extension-less structures

Talitha Nicoletti João Antonio Martino 1959-; S Santos; L Almeida; Marc Aoulaiche; A Veloso; Michael J Jurczak; Eddy Simoen; Cor Claeys; International Conference on Ultimate Integration on Silicon (13th 2012 Grenoble, FR)

Proceedings of the conference Grenoble, 2012

Piscataway IEEE 2012

Item não circula. Consulte sua biblioteca.(Acessar)

4
Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS
Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS

Sara Dereste dos Santos Talitha Nicoletti; Marc Aoulaiche; João Antonio Martino 1959-; A Veloso; Malgorzata Jurczak; Eddy Simoen; Cor Claeys; International Symposium on Microelectronics Technology and Devices (27th 2012 Brasilia)

Microelectronics technology and devices, SBMicro Pennington: Electrochemical Society, 2012

Pennington 2012

Item não circula. Consulte sua biblioteca.(Acessar)

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Deste Autor:

  1. Claeys, C
  2. Santos, S
  3. Jurczak, M
  4. Veloso, A
  5. Martino, J

Neste Assunto:

  1. Microeletrônica
  2. Silício
  3. Transistores
  4. Circuitos Integrados
  5. Temperatura

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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