Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
---|---|---|---|
1 |
Material Type: Artigo
|
Plasma immersion ion implantation in arc and glow discharge plasmas submitted to low magnetic fieldsTan, I.H. ; Ueda, M. ; Oliveira, R.M. ; Dallaqua, R.S. ; Reuther, H.Surface & coatings technology, 2007-02, Vol.201 (9), p.4826-4831 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
|
2 |
Material Type: Artigo
|
Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic fieldUeda, M. ; Tan, I.H. ; Dallaqua, R.S. ; Rossi, J.O.Surface & coatings technology, 2007-04, Vol.201 (15), p.6597-6600 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
|
3 |
Material Type: Artigo
|
Magnetic field effects on secondary electrons emitted during ion implantation in vacuum arc plasmasTan, I.H. ; Ueda, M. ; Dallaqua, R.S. ; Rossi, J.O.Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2006-01, Vol.242 (1-2), p.332-334 [Periódico revisado por pares]Elsevier B.VTexto completo disponível |