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Refinado por: Nome da Publicação: Journal Of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films remover Journal Of Vacuum Science & Technology A: Vacuum, Surfaces, And Films remover assunto: Physics remover
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Reaction kinetics of surface silicon hydrides
Reaction kinetics of surface silicon hydrides
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Reaction kinetics of surface silicon hydrides

Greenlief, C. Michael ; Gates, Stephen M. ; Holbert, Philip A.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1989-05, Vol.7 (3), p.1845-1849 [Periódico revisado por pares]

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2
Surface reactions in Si chemical vapor deposition from silane
Surface reactions in Si chemical vapor deposition from silane
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Surface reactions in Si chemical vapor deposition from silane

Gates, S. M. ; Greenlief, C. M. ; Kulkarni, S. K. ; Sawin, H. H.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1990-05, Vol.8 (3), p.2965-2969 [Periódico revisado por pares]

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3
Equilibrium surface hydrogen coverage during silicon epitaxy using SiH4
Equilibrium surface hydrogen coverage during silicon epitaxy using SiH4
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Equilibrium surface hydrogen coverage during silicon epitaxy using SiH4

Liehr, M. ; Greenlief, C. M. ; Offenberg, M. ; Kasi, S. R.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1990-05, Vol.8 (3), p.2960-2964 [Periódico revisado por pares]

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4
Kinetics and mechanics of Si2H6 surface decomposition on Si
Kinetics and mechanics of Si2H6 surface decomposition on Si
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Kinetics and mechanics of Si2H6 surface decomposition on Si

Kulkarni, S. K. ; Gates, S. M. ; Greenlief, C. M. ; Sawin, H. H.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1990-05, Vol.8 (3), p.2956-2959 [Periódico revisado por pares]

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5
Surface reactions of Ge containing organometallics on Si(100)
Surface reactions of Ge containing organometallics on Si(100)
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Surface reactions of Ge containing organometallics on Si(100)

Greenlief, C. Michael ; Wankum, Patricia C. ; Klug, Debra‐Ann ; Keeling, Lori A.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1992-07, Vol.10 (4), p.2465-2469 [Periódico revisado por pares]

WOODBURY: Amer Inst Physics

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6
Adsorption and decomposition of hydrides on Ge(100)
Adsorption and decomposition of hydrides on Ge(100)
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Adsorption and decomposition of hydrides on Ge(100)

Cohen, Stephen M. ; Yang, Yuemei L. ; Rouchouze, Eric ; Jin, Tuo ; D’Evelyn, Mark P.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1992-07, Vol.10 (4), p.2166-2171 [Periódico revisado por pares]

WOODBURY: Amer Inst Physics

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7
State‐specific study of hydrogen desorption from Si(100)‐(2×1): Comparison of disilane and hydrogen adsorption
State‐specific study of hydrogen desorption from Si(100)‐(2×1): Comparison of disilane and hydrogen adsorption
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State‐specific study of hydrogen desorption from Si(100)‐(2×1): Comparison of disilane and hydrogen adsorption

Shane, S. F. ; Kolasinski, K. W. ; Zare, R. N.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1992-07, Vol.10 (4), p.2287-2291 [Periódico revisado por pares]

WOODBURY: Amer Inst Physics

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8
Electrophoretic deposition of pure MoS2 dry film lubricant coatings
Electrophoretic deposition of pure MoS2 dry film lubricant coatings
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Electrophoretic deposition of pure MoS2 dry film lubricant coatings

Panitz, Janda K. G. ; Dugger, M. T. ; Peebles, D. E. ; Tallant, D. R. ; Hills, C. R.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1993-07, Vol.11 (4), p.1441-1446 [Periódico revisado por pares]

Melville, NY: American Institute of Physics

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9
Reflector atomic hydrogen source: A method for producing pure atomic hydrogen in ultrahigh vacuum
Reflector atomic hydrogen source: A method for producing pure atomic hydrogen in ultrahigh vacuum
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Reflector atomic hydrogen source: A method for producing pure atomic hydrogen in ultrahigh vacuum

Bornscheuer, K. H. ; Lucas, S. R. ; Choyke, W. J. ; Partlow, W. D. ; Yates, J. T.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1993-09, Vol.11 (5), p.2822-2826 [Periódico revisado por pares]

Melville, NY: American Institute of Physics

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10
Investigation of the kinetics of digermane chemisorption and reaction product desorption in thin film growth of germanium
Investigation of the kinetics of digermane chemisorption and reaction product desorption in thin film growth of germanium
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Investigation of the kinetics of digermane chemisorption and reaction product desorption in thin film growth of germanium

Eres, Gyula ; Sharp, J. W.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1993-09, Vol.11 (5), p.2463-2471 [Periódico revisado por pares]

Melville, NY: American Institute of Physics

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