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A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps
A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps
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Artigo 		Adicionar ao Meu Espaço

A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps

Sebastião Gomes dos Santos Filho 1962- Claus Martin Hasenack; L C Salay; P W Mertens

Pennington v.142, n.3 , p.902-7, mar. 1995 Journal of the Electrochemical Society

Pennington 1995

Item não circula. Consulte sua biblioteca.(Acessar)

2
A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps
A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps
Material Type:
Artigo 		Adicionar ao Meu Espaço

A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps

Sebastião Gomes dos Santos Filho 1962- Claus Martin Hasenack; L C Salay; P W Mertens

Pennington v.142, n.3 , p.902-7, mar. 1995 Journal of the Electrochemical Society

Pennington 1995

Item não circula. Consulte sua biblioteca.(Acessar)

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Deste Autor:

  1. Salay, L
  2. Hasenack, C
  3. Santos Filho, S
  4. Mertens, P

Neste Assunto:

  1. Circuitos Integrados

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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