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1
Direct‐laser writing of silicon microstructures: Raman microprobe diagnostics and modeling of the nucleation phase of deposition
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Direct‐laser writing of silicon microstructures: Raman microprobe diagnostics and modeling of the nucleation phase of deposition

Herman, Irving P. ; Magnotta, Frank ; Kotecki, David E.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-05, Vol.4 (3), p.659-664 [Periódico revisado por pares]

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2
On structure and properties of sputtered Ti and Al based hard compound films
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On structure and properties of sputtered Ti and Al based hard compound films

Knotek, O. ; Böhmer, M. ; Leyendecker, T.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-11, Vol.4 (6), p.2695-2700 [Periódico revisado por pares]

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3
Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminum
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Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminum

Knotek, O. ; Münz, W. D. ; Leyendecker, T.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1987-07, Vol.5 (4), p.2173-2179 [Periódico revisado por pares]

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4
Comparison of M‐region x‐ray and Auger electron spectra for near‐threshold electron excitation of metallic and oxidized lanthanum
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Comparison of M‐region x‐ray and Auger electron spectra for near‐threshold electron excitation of metallic and oxidized lanthanum

Wachter, Joseph R. ; Liefeld, Robert J.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1989-03, Vol.7 (2), p.249-252 [Periódico revisado por pares]

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