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Refinado por: Nome da Publicação: J. Vac. Sci. Technol., A; remover assunto: Materials Science, Coatings & Films remover Journal Of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films remover
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On structure and properties of sputtered Ti and Al based hard compound films
On structure and properties of sputtered Ti and Al based hard compound films
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On structure and properties of sputtered Ti and Al based hard compound films

Knotek, O. ; Böhmer, M. ; Leyendecker, T.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-11, Vol.4 (6), p.2695-2700 [Periódico revisado por pares]

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2
Comparison of M‐region x‐ray and Auger electron spectra for near‐threshold electron excitation of metallic and oxidized lanthanum
Comparison of M‐region x‐ray and Auger electron spectra for near‐threshold electron excitation of metallic and oxidized lanthanum
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Comparison of M‐region x‐ray and Auger electron spectra for near‐threshold electron excitation of metallic and oxidized lanthanum

Wachter, Joseph R. ; Liefeld, Robert J.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1989-03, Vol.7 (2), p.249-252 [Periódico revisado por pares]

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