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Effect of Self-Assembled Monolayers on Charge Injection and Transport in Poly(3-hexylthiophene)-Based Field-Effect Transistors at Different Channel Length Scales
Effect of Self-Assembled Monolayers on Charge Injection and Transport in Poly(3-hexylthiophene)-Based Field-Effect Transistors at Different Channel Length Scales
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Effect of Self-Assembled Monolayers on Charge Injection and Transport in Poly(3-hexylthiophene)-Based Field-Effect Transistors at Different Channel Length Scales

Singh, K. A ; Nelson, T. L ; Belot, J. A ; Young, T. M ; Dhumal, N. R ; Kowalewski, T ; McCullough, R. D ; Nachimuthu, P ; Thevuthasan, S ; Porter, L. M

ACS applied materials & interfaces, 2011-08, Vol.3 (8), p.2973-2978 [Periódico revisado por pares]

United States: American Chemical Society

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2
Tris(dialkylamino)aluminums: Syntheses, characterization, volatility comparison and atomic layer deposition of alumina thin films
Tris(dialkylamino)aluminums: Syntheses, characterization, volatility comparison and atomic layer deposition of alumina thin films
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Tris(dialkylamino)aluminums: Syntheses, characterization, volatility comparison and atomic layer deposition of alumina thin films

Wade, Casey R. ; Silvernail, Carter ; Banerjee, Chiranjib ; Soulet, Axel ; McAndrew, James ; Belot, John A.

Materials letters, 2007-12, Vol.61 (29), p.5079-5082 [Periódico revisado por pares]

Elsevier B.V

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3
Toward New Magnetic, Electronic, and Optical Materials: Synthesis and Characterization of New Bimetallic Tetrathiafulvalene Tetrathiolate Building Blocks
Toward New Magnetic, Electronic, and Optical Materials: Synthesis and Characterization of New Bimetallic Tetrathiafulvalene Tetrathiolate Building Blocks
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Toward New Magnetic, Electronic, and Optical Materials: Synthesis and Characterization of New Bimetallic Tetrathiafulvalene Tetrathiolate Building Blocks

McCullough, Richard D ; Belot, John A

Chemistry of materials, 1994-08, Vol.6 (8), p.1396-1403 [Periódico revisado por pares]

American Chemical Society

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4
Thermal reactivity of hydrogenosilsesquioxane gels
Thermal reactivity of hydrogenosilsesquioxane gels
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Thermal reactivity of hydrogenosilsesquioxane gels

Belot, V ; Corriu, R ; Leclercq, D ; Mutin, P. H ; Vioux, A

Chemistry of materials, 1991-01, Vol.3 (1), p.127-131 [Periódico revisado por pares]

American Chemical Society

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5
Polydentate Amines as CVD Precursor Ancillary Ligands. Epitaxial MgO Thin-Film Growth Using a Highly Volatile, Thermally and Air-Stable Magnesium Precursor
Polydentate Amines as CVD Precursor Ancillary Ligands. Epitaxial MgO Thin-Film Growth Using a Highly Volatile, Thermally and Air-Stable Magnesium Precursor
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Polydentate Amines as CVD Precursor Ancillary Ligands. Epitaxial MgO Thin-Film Growth Using a Highly Volatile, Thermally and Air-Stable Magnesium Precursor

Babcock, J. R. ; Benson, D. D. ; Wang, A. ; Edleman, N. L. ; Belot, J. A. ; Metz, M. V. ; Marks, T. J.

Chemical vapor deposition, 2000-08, Vol.6 (4), p.180-183 [Periódico revisado por pares]

Weinheim: WILEY-VCH Verlag GmbH

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6
Plasma-Assisted MOCVD Growth of Superconducting NbN Thin Films Using Nb Dialkylamide and Nb Alkylimide Precursors
Plasma-Assisted MOCVD Growth of Superconducting NbN Thin Films Using Nb Dialkylamide and Nb Alkylimide Precursors
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Plasma-Assisted MOCVD Growth of Superconducting NbN Thin Films Using Nb Dialkylamide and Nb Alkylimide Precursors

Liu, X. ; Babcock, J. R. ; Lane, M. A. ; Belot, J. A. ; Ott, A. W. ; Metz, M. V. ; Kannewurf, C. R. ; Chang, R. P. H. ; Marks, T. J.

Chemical vapor deposition, 2001-01, Vol.7 (1), p.25-28 [Periódico revisado por pares]

Weinheim: WILEY-VCH Verlag GmbH

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7
MOCVD of Epitaxial BaTiO3 Films Using a Liquid Barium Precursor
MOCVD of Epitaxial BaTiO3 Films Using a Liquid Barium Precursor
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MOCVD of Epitaxial BaTiO3 Films Using a Liquid Barium Precursor

Teren, A. R. ; Belot, J. A. ; Edleman, N. L. ; Marks, T. J. ; Wessels, B. W.

Chemical vapor deposition, 2000-08, Vol.6 (4), p.175-177 [Periódico revisado por pares]

Weinheim: WILEY-VCH Verlag GmbH

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8
Expedient route to volatile zirconium metal-organic chemical vapor deposition precursors using amide synthons and implementation in yttria-stabilized zirconia film growth
Expedient route to volatile zirconium metal-organic chemical vapor deposition precursors using amide synthons and implementation in yttria-stabilized zirconia film growth
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Expedient route to volatile zirconium metal-organic chemical vapor deposition precursors using amide synthons and implementation in yttria-stabilized zirconia film growth

Belot, John A. ; McNeely, Richard J. ; Wang, Anchuan ; Reedy, Charles J. ; Marks, Tobin J. ; Yap, Glenn P. A. ; Rheingold, Arnold L.

Journal of materials research, 1999-01, Vol.14 (1), p.12-15 [Periódico revisado por pares]

New York, USA: Cambridge University Press

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9
Analysis of the fluoride effect on the phase-selective growth of TlBa2Ca2Cu3O9−x thin films: Phase evolution and microstructure development
Analysis of the fluoride effect on the phase-selective growth of TlBa2Ca2Cu3O9−x thin films: Phase evolution and microstructure development
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Analysis of the fluoride effect on the phase-selective growth of TlBa2Ca2Cu3O9−x thin films: Phase evolution and microstructure development

McNeely, Richard J. ; Belot, John A. ; Marks, Tobin J. ; Wang, Yanguo ; Dravid, Vinayak P. ; Chudzik, Michael P. ; Kannewurf, Carl R. WCA

Journal of materials research, 2000-05, Vol.15 (5), p.1083-1097 [Periódico revisado por pares]

New York, USA: Cambridge University Press

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10
Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films
Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films
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Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films

BELOT, J. A ; WANG, A ; MCNEELY, R. J ; LIABLE-SANDS, L ; RHEINGOLD, A. L ; MARKS, T. J

Chemical vapor deposition, 1999-03, Vol.5 (2), p.65-69 [Periódico revisado por pares]

Weinheim: Wiley-VCH

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