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1 |
Material Type: Artículo
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NanoElectronics roadmap for Europe: From nanodevices and innovative materials to system integrationAhopelto, J. ; Ardila, G. ; Baldi, L. ; Balestra, F. ; Belot, D. ; Fagas, G. ; De Gendt, S. ; Demarchi, D. ; Fernandez-Bolaños, M. ; Holden, D. ; Ionescu, A.M. ; Meneghesso, G. ; Mocuta, A. ; Pfeffer, M. ; Popp, R.M. ; Sangiorgi, E. ; Sotomayor Torres, C.M.Solid-state electronics, 2019-05, Vol.155, p.7-19 [Revista revisada por pares]Elsevier LtdTexto completo disponible |
2 |
Material Type: Acta de Congreso
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Design Techniques and Modeling for 60GHz Applications With a 65nm-CMOS-RF TechnologyAloui, S. ; Kerherve, E. ; Belot, D. ; Plana, R.2008 Global Symposium on Millimeter Waves, 2008, p.241-244IEEETexto completo disponible |
3 |
Material Type: Artículo
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High-Gain and Linear 60-GHz Power Amplifier With a Thin Digital 65-nm CMOS TechnologyAloui, S. ; Leite, B. ; Demirel, N. ; Plana, R. ; Belot, D. ; Kerherve, E.IEEE transactions on microwave theory and techniques, 2013-06, Vol.61 (6), p.2425-2437 [Revista revisada por pares]New York, NY: IEEETexto completo disponible |
4 |
Material Type: Artículo
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Polydentate Amines as CVD Precursor Ancillary Ligands. Epitaxial MgO Thin-Film Growth Using a Highly Volatile, Thermally and Air-Stable Magnesium PrecursorBabcock, J. R. ; Benson, D. D. ; Wang, A. ; Edleman, N. L. ; Belot, J. A. ; Metz, M. V. ; Marks, T. J.Chemical vapor deposition, 2000-08, Vol.6 (4), p.180-183 [Revista revisada por pares]Weinheim: WILEY-VCH Verlag GmbHTexto completo disponible |
5 |
Material Type: Artículo
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Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin filmsBELOT, J. A ; WANG, A ; MCNEELY, R. J ; LIABLE-SANDS, L ; RHEINGOLD, A. L ; MARKS, T. JChemical vapor deposition, 1999-03, Vol.5 (2), p.65-69 [Revista revisada por pares]Weinheim: Wiley-VCHTexto completo disponible |
6 |
Material Type: Artículo
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Expedient route to volatile zirconium metal-organic chemical vapor deposition precursors using amide synthons and implementation in yttria-stabilized zirconia film growthBelot, John A. ; McNeely, Richard J. ; Wang, Anchuan ; Reedy, Charles J. ; Marks, Tobin J. ; Yap, Glenn P. A. ; Rheingold, Arnold L.Journal of materials research, 1999-01, Vol.14 (1), p.12-15 [Revista revisada por pares]New York, USA: Cambridge University PressTexto completo disponible |
7 |
Material Type: Artículo
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The Three Ages of Fuel Cell Research in France: A Socio-Technical System's Resistance to ChangeBelot, R. ; Picard, F.Fuel cells (Weinheim an der Bergstrasse, Germany), 2014-06, Vol.14 (3), p.525-532 [Revista revisada por pares]Weinheim: WILEY-VCH VerlagTexto completo disponible |
8 |
Material Type: Artículo
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Thermal reactivity of hydrogenosilsesquioxane gelsBelot, V ; Corriu, R ; Leclercq, D ; Mutin, P. H ; Vioux, AChemistry of materials, 1991-01, Vol.3 (1), p.127-131 [Revista revisada por pares]American Chemical SocietyTexto completo disponible |
9 |
Material Type: Artículo
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Preparation of oxynitride silicon glasses. Nitridation of functional silica xerogelsBelot, V. ; Corriu, R. ; Leclercq, D. ; Mutin, P.H. ; Vioux, A.Journal of non-crystalline solids, 1992, Vol.147, p.309-312 [Revista revisada por pares]AMSTERDAM: Elsevier B.VTexto completo disponible |
10 |
Material Type: Artículo
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Sol-gel route to silicon suboxides. Preparation and characterization of silicon sesquioxideBelot, V. ; Corriu, R.J.P. ; Leclercq, D. ; Lefèvre, P. ; Mutin, P.H. ; Vioux, A. ; Flank, A.M.Journal of non-crystalline solids, 1991-02, Vol.127 (2), p.207-214 [Revista revisada por pares]Amsterdam: Elsevier B.VTexto completo disponible |