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Towards Oxide Electronics: a Roadmap
Towards Oxide Electronics: a Roadmap
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Towards Oxide Electronics: a Roadmap

Coll, M. ; Fontcuberta, J. ; Althammer, M. ; Bibes, M. ; Boschker, H. ; Calleja, A. ; Cheng, G. ; Cuoco, M. ; Dittmann, R. ; Dkhil, B. ; El Baggari, I. ; Fanciulli, M. ; Fina, I. ; Fortunato, E. ; Frontera, C. ; Fujita, S. ; Garcia, V. ; Goennenwein, S.T.B. ; Granqvist, C.-G. ; Grollier, J. ; Gross, R. ; Hagfeldt, A. ; Herranz, G. ; Hono, K. ; Houwman, E. ; Huijben, M. ; Kalaboukhov, A. ; Keeble, D.J. ; Koster, G. ; Kourkoutis, L.F. ; Levy, J. ; Lira-Cantu, M. ; MacManus-Driscoll, J.L. ; Mannhart, Jochen ; Martins, R. ; Menzel, S. ; Mikolajick, T. ; Napari, M. ; Nguyen, M.D. ; Niklasson, G. ; Paillard, C. ; Panigrahi, S. ; Rijnders, G. ; Sánchez, F. ; Sanchis, P. ; Sanna, S. ; Schlom, D.G. ; Schroeder, U. ; Shen, K.M. ; Siemon, A. ; Spreitzer, M. ; Sukegawa, H. ; Tamayo, R. ; van den Brink, J. ; Pryds, N. ; Granozio, F. Miletto

Applied surface science, 2019-07, Vol.482, p.1-93 [Periódico revisado por pares]

Elsevier B.V

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Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes
Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes
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Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes

Volynets, Vladimir ; Barsukov, Yuri ; Kim, Gonjun ; Jung, Ji-Eun ; Nam, Sang Ki ; Han, Kyuhee ; Huang, Shuo ; Kushner, Mark J.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-03, Vol.38 (2) [Periódico revisado por pares]

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Review-Recent Progress in the Graphene-Based Electrochemical Sensors and Biosensors
Review-Recent Progress in the Graphene-Based Electrochemical Sensors and Biosensors
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Review-Recent Progress in the Graphene-Based Electrochemical Sensors and Biosensors

Coroş, Maria ; Pruneanu, Stela ; Stefan-van Staden, Raluca-Ioana

Journal of the Electrochemical Society, 2019-12, Vol.167 (3), p.37528 [Periódico revisado por pares]

The Electrochemical Society

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Time evolution of ion fluxes incident at the substrate plane during reactive high-power impulse magnetron sputtering of groups IVb and VIb transition metals in Ar/N2
Time evolution of ion fluxes incident at the substrate plane during reactive high-power impulse magnetron sputtering of groups IVb and VIb transition metals in Ar/N2
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Time evolution of ion fluxes incident at the substrate plane during reactive high-power impulse magnetron sputtering of groups IVb and VIb transition metals in Ar/N2

Greczynski, Grzegorz ; Zhirkov, Igor ; Petrov, Ivan ; Greene, J. E. ; Rosen, Johanna

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-03, Vol.36 (2) [Periódico revisado por pares]

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5
Review-The Importance of Chemical Interactions between Sulfur Host Materials and Lithium Polysulfides for Advanced Lithium-Sulfur Batteries
Review-The Importance of Chemical Interactions between Sulfur Host Materials and Lithium Polysulfides for Advanced Lithium-Sulfur Batteries
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Review-The Importance of Chemical Interactions between Sulfur Host Materials and Lithium Polysulfides for Advanced Lithium-Sulfur Batteries

Pang, Quan ; Liang, Xiao ; Kwok, C. Y. ; Nazar, Linda F.

Journal of the Electrochemical Society, 2015-01, Vol.162 (14), p.A2567-A2576 [Periódico revisado por pares]

The Electrochemical Society

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6
Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride
Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride
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Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride

Shinoda, Kazunori ; Miyoshi, Nobuya ; Kobayashi, Hiroyuki ; Izawa, Masaru ; Saeki, Tomonori ; Ishikawa, Kenji ; Hori, Masaru

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-09, Vol.37 (5) [Periódico revisado por pares]

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7
Piezoelectric ZnO thin films for 2DOF MEMS vibrational energy harvesting
Piezoelectric ZnO thin films for 2DOF MEMS vibrational energy harvesting
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Piezoelectric ZnO thin films for 2DOF MEMS vibrational energy harvesting

Tao, Kai ; Yi, Haiping ; Tang, Lihua ; Wu, Jin ; Wang, Peihong ; Wang, Nan ; Hu, Liangxing ; Fu, Yongqing ; Miao, Jianmin ; Chang, Honglong

Surface & coatings technology, 2019-02, Vol.359, p.289-295 [Periódico revisado por pares]

Lausanne: Elsevier B.V

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8
A New Michael-Reaction-Resistant Benzoquinone for Aqueous Organic Redox Flow Batteries
A New Michael-Reaction-Resistant Benzoquinone for Aqueous Organic Redox Flow Batteries
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A New Michael-Reaction-Resistant Benzoquinone for Aqueous Organic Redox Flow Batteries

Hoober-Burkhardt, Lena ; Krishnamoorthy, Sankarganesh ; Yang, Bo ; Murali, Advaith ; Nirmalchandar, Archith ; Prakash, G. K. Surya ; Narayanan, S. R.

Journal of the Electrochemical Society, 2017-01, Vol.164 (4), p.A600-A607 [Periódico revisado por pares]

The Electrochemical Society

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9
Synthesis of surface molecular imprinted TiO2/graphene photocatalyst and its highly efficient photocatalytic degradation of target pollutant under visible light irradiation
Synthesis of surface molecular imprinted TiO2/graphene photocatalyst and its highly efficient photocatalytic degradation of target pollutant under visible light irradiation
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Synthesis of surface molecular imprinted TiO2/graphene photocatalyst and its highly efficient photocatalytic degradation of target pollutant under visible light irradiation

Lai, Cui ; Wang, Man-Man ; Zeng, Guang-Ming ; Liu, Yun-Guo ; Huang, Dan-Lian ; Zhang, Chen ; Wang, Rong-Zhong ; Xu, Piao ; Cheng, Min ; Huang, Chao ; Wu, Hai-Peng ; Qin, Lei

Applied surface science, 2016-12, Vol.390, p.368-376 [Periódico revisado por pares]

Elsevier B.V

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10
Interlaboratory determination of the calibration factor for the measurement of the interstitial oxygen content of silicon by infrared absorption
Interlaboratory determination of the calibration factor for the measurement of the interstitial oxygen content of silicon by infrared absorption
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Interlaboratory determination of the calibration factor for the measurement of the interstitial oxygen content of silicon by infrared absorption

BAGHDADI, A ; BULLIS, W. M ; CROARKIN, M. C ; YUE-ZHEN LI ; SCACE, R. I ; SERIES, R. W ; STALLHOFER, P ; WATANABE, M

Journal of the Electrochemical Society, 2019-12, Vol.136 (7), p.2015-2024 [Periódico revisado por pares]

Pennington, NJ: Electrochemical Society

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