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Resultados de 1 a 10 de 16  para Produção Intelectual da USP

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Refinado por: Nome da Publicação: SBMicro 2000: proceedings remover
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1
Micromechanical structures development to concentrate hydrocarbons from air
Micromechanical structures development to concentrate hydrocarbons from air
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Micromechanical structures development to concentrate hydrocarbons from air

Maria Lucia Pereira da Silva 1957- Rogério Furlan 1959-; Silvana G Souza; International Conference on Microelectronics and Packaging (15. 2000 Manaus)

SBMicro 2000: proceedings Manaus : SBMicro/UA/UFGRS/UNICAMP/USP, 2000

Manaus SBMicro/UA/UFRGS/UNICAMP/USP 2000

Item não circula. Consulte sua biblioteca.(Acessar)

2
Determination of oxide charge density at the gate oxide/silicon film interface in SOI-MOS capacitor
Determination of oxide charge density at the gate oxide/silicon film interface in SOI-MOS capacitor
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Determination of oxide charge density at the gate oxide/silicon film interface in SOI-MOS capacitor

Victor Sonnenberg João Antonio Martino 1959-; International Conference on Microelectronics and Packaging (15. 2000 Manaus)

SBMicro 2000: proceedings Manaus : SBMicro/UA/UFGRS/UNICAMP/USP, 2000

Manaus SBMicro/UA/UFRGS/UNICAMP/USP 2000

Item não circula. Consulte sua biblioteca.(Acessar)

3
Parasitic bipolar effects in graded-channel fully-depleted silicon-on-insulator nMOSFET
Parasitic bipolar effects in graded-channel fully-depleted silicon-on-insulator nMOSFET
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Parasitic bipolar effects in graded-channel fully-depleted silicon-on-insulator nMOSFET

Marcelo Antonio Pavanello João Antonio Martino 1959-; Denis Flandre; International Conference on Microelectronics and Packaging (15. 2000 Manaus)

SBMicro 2000: proceedings Manaus : SBMicro/UA/UFGRS/UNICAMP/USP, 2000

Manaus SBMicro/UA/UFRGS/UNICAMP/USP 2000

Item não circula. Consulte sua biblioteca.(Acessar)

4
A new experimental procedure to obtain the refractive index of MOS gate oxynitrides grown by RTP in N2O atmosphere
A new experimental procedure to obtain the refractive index of MOS gate oxynitrides grown by RTP in N2O atmosphere
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

A new experimental procedure to obtain the refractive index of MOS gate oxynitrides grown by RTP in N2O atmosphere

Leandro Zeidan Toquetti Sebastião Gomes dos Santos Filho 1962-; International Conference on Microelectronics and Packaging (15. 2000 Manaus)

SBMicro 2000: proceedings Manaus : SBMicro/UA/UFGRS/UNICAMP/USP, 2000

Manaus SBMicro/UA/UFRGS/UNICAMP/USP 2000

Item não circula. Consulte sua biblioteca.(Acessar)

5
RF electrical measurements in plasma processing reactors
RF electrical measurements in plasma processing reactors
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

RF electrical measurements in plasma processing reactors

Marcelo B. Pisani Patrick Bernard Verdonck 1958-; International Conference on Microelectronics and Packaging (15. 2000 Manaus)

SBMicro 2000: proceedings Manaus : SBMicro/UA/UFGRS/UNICAMP/USP, 2000

Manaus SBMicro/UA/UFRGS/UNICAMP/USP 2000

Item não circula. Consulte sua biblioteca.(Acessar)

6
A new mechanism for silicon etching with fluorine based plasmas
A new mechanism for silicon etching with fluorine based plasmas
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

A new mechanism for silicon etching with fluorine based plasmas

Patrick Bernard Verdonck 1958- A Goodyear; Ronaldo Domingues Mansano 1964-; P.R.J Barroy; N.St.J Braithwaite; International Conference on Microelectronics and Packaging (15. 2000 Manaus)

SBMicro 2000: proceedings Manaus : SBMicro/UA/UFGRS/UNICAMP/USP, 2000

Manaus SBMicro/UA/UFRGS/UNICAMP/USP 2000

Item não circula. Consulte sua biblioteca.(Acessar)

7
Study of the deep-submicron SOI MOSFET leakage current behavior at high temperatures
Study of the deep-submicron SOI MOSFET leakage current behavior at high temperatures
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Study of the deep-submicron SOI MOSFET leakage current behavior at high temperatures

Marcello Bellodi Benjamin Iniguez; Cristine Raynaud; Denis Flandre; João Antonio Martino 1959-; International Conference on Microelectronics and Packaging (15. 2000 Manaus)

SBMicro 2000: proceedings Manaus : SBMicro/UA/UFGRS/UNICAMP/USP, 2000

Manaus SBMicro/UA/UFRGS/UNICAMP/USP 2000

Item não circula. Consulte sua biblioteca.(Acessar)

8
Partial dielectric breakdown in MOS gate oxide grown by RTO
Partial dielectric breakdown in MOS gate oxide grown by RTO
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Partial dielectric breakdown in MOS gate oxide grown by RTO

Willian Aurélio Nogueira Sebastião Gomes dos Santos Filho 1962-; International Conference on Microelectronics and Packaging (15. 2000 Manaus)

SBMicro 2000: proceedings Manaus : SBMicro/UA/UFGRS/UNICAMP/USP, 2000

Manaus SBMicro/UA/UFRGS/UNICAMP/USP 2000

Item não circula. Consulte sua biblioteca.(Acessar)

9
Analysis of TEOS+O2 plasma - the influence of energy and gas flow on the deposition process
Analysis of TEOS+O2 plasma - the influence of energy and gas flow on the deposition process
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Analysis of TEOS+O2 plasma - the influence of energy and gas flow on the deposition process

Ana Neilde Rodrigues da Silva Maria Lucia Pereira da Silva 1957-; Nilton Itiro Morimoto 1962-; Olivier Bonnaud; International Conference on Microelectronics and Packaging (15. 2000 Manaus)

SBMicro 2000: proceedings Manaus : SBMicro/UA/UFGRS/UNICAMP/USP, 2000

Manaus SBMicro/UA/UFRGS/UNICAMP/USP 2000

Item não circula. Consulte sua biblioteca.(Acessar)

10
Analysis of the surface roughness and surface particle concentration using a new technique integrated angle resolved LASER scattering (IARLS)
Analysis of the surface roughness and surface particle concentration using a new technique integrated angle resolved LASER scattering (IARLS)
Material Type:
Artigo de Congresso 		Adicionar ao Meu Espaço

Analysis of the surface roughness and surface particle concentration using a new technique integrated angle resolved LASER scattering (IARLS)

José Cândido de Souza Filho Sebastião Gomes dos Santos Filho 1962-; International Conference on Microelectronics and Packaging (15. 2000 Manaus)

SBMicro 2000: proceedings Manaus : SBMicro/UA/UFGRS/UNICAMP/USP, 2000

Manaus SBMicro/UA/UFRGS/UNICAMP/USP 2000

Item não circula. Consulte sua biblioteca.(Acessar)

Resultados de 1 a 10 de 16  para Produção Intelectual da USP

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Deste Autor:

  1. International Conference on Microelectronics and Packaging
  2. Martino, J
  3. Furlan, R
  4. Flandre, D
  5. Santos Filho, S

Neste Assunto:

  1. Circuitos Integrados

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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