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Refinado por: Nome da Publicação: Japanese Journal Of Applied Physics remover
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1
High Performance Low Temperature Polycrystalline Silicon Thin Film Transistors on Non-alkaline Glass Produced Using Diode Pumped Solid State Continuous Wave Laser Lateral Crystallization
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High Performance Low Temperature Polycrystalline Silicon Thin Film Transistors on Non-alkaline Glass Produced Using Diode Pumped Solid State Continuous Wave Laser Lateral Crystallization

Hara, Akito ; Takei, Michiko ; Takeuchi, Fumiyo ; Suga, Katsuyuki ; Yoshino, Kenichi ; Chida, Mitsuru ; Kakehi, Tatsuya ; Ebiko, Yoshiki ; Sano, Yasuyuki ; Sasaki, Nobuo

Japanese Journal of Applied Physics, 2004, Vol.43 (4R), p.1269-1276 [Periódico revisado por pares]

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High-Performance Polycrystalline Silicon Thin Film Transistors on Non-Alkali Glass Produced Using Continuous Wave Laser Lateral Crystallization
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High-Performance Polycrystalline Silicon Thin Film Transistors on Non-Alkali Glass Produced Using Continuous Wave Laser Lateral Crystallization

Hara, Akito ; Takeuchi, Fumiyo ; Takei, Michiko ; Suga, Katsuyuki ; Yoshino, Kenichi ; Chida, Mitsuru ; Sano, Yasuyuki ; Sasaki, Nobuo

Japanese Journal of Applied Physics, 2002-03, Vol.41 (Part 2, No. 3B), p.L311-L313 [Periódico revisado por pares]

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3
Selective Single-Crystalline-Silicon Growth at the Pre-defined Active Region of a Thin Film Transistor on Glass by Using Continuous Wave Laser Irradiation
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Selective Single-Crystalline-Silicon Growth at the Pre-defined Active Region of a Thin Film Transistor on Glass by Using Continuous Wave Laser Irradiation

Hara, Akito ; Yoshino, Kenichi ; Takeuchi, Fumiyo ; Sasaki, Nobuo

Japanese Journal of Applied Physics, 2003-01, Vol.42 (Part 1, No. 1), p.23-27 [Periódico revisado por pares]

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4
Micro-Scale Characterization of Crystalline Phase and Stress in Laser-Crystallized Poly-Si Thin Films by Raman Spectroscopy
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Micro-Scale Characterization of Crystalline Phase and Stress in Laser-Crystallized Poly-Si Thin Films by Raman Spectroscopy

Kitahara, Kuninori ; Moritani, Akihiro ; Hara, Akito ; Okabe, Masahiro

Japanese Journal of Applied Physics, 1999-11, Vol.38 (11B), p.L1312 [Periódico revisado por pares]

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5
Self-Aligned Metal Double-Gate Low-Temperature Polycrystalline Silicon Thin-Film Transistors on Non-Alkali Glass Substrate Using Diode-Pumped Solid-State Continuous Wave Laser Lateral Crystallization
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Self-Aligned Metal Double-Gate Low-Temperature Polycrystalline Silicon Thin-Film Transistors on Non-Alkali Glass Substrate Using Diode-Pumped Solid-State Continuous Wave Laser Lateral Crystallization

Hara, Akito ; Takei, Michiko ; Yoshino, Kenichi ; Takeuchi, Fumiyo ; Sasaki, Nobuo

Japanese Journal of Applied Physics, 2004-06, Vol.43 (6B), p.L790 [Periódico revisado por pares]

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6
Control of Nucleation and Solidification Direction of Polycrystalline Silicon by Excimer Laser Irradiation
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Control of Nucleation and Solidification Direction of Polycrystalline Silicon by Excimer Laser Irradiation

Hara, Akito ; Sasaki, Nobuo

Japanese Journal of Applied Physics, 2000-01, Vol.39 (1A), p.L1 [Periódico revisado por pares]

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7
Nonsteady Flow in Capillary Tubes
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Nonsteady Flow in Capillary Tubes

Hara, Ayako

Japanese Journal of Applied Physics, 2000-03, Vol.39 (3R), p.1437 [Periódico revisado por pares]

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8
Hydrogen-like ultrashallow thermal donors in silicon crystals
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Hydrogen-like ultrashallow thermal donors in silicon crystals

HARA, A

Japanese Journal of Applied Physics, 1995, Vol.34 (7A), p.3418-3425 [Periódico revisado por pares]

Tokyo: Japanese journal of applied physics

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9
Effects of grown-in hydrogen on lifetime of Czochralski silicon crystals
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Effects of grown-in hydrogen on lifetime of Czochralski silicon crystals

HARA, A

Japanese Journal of Applied Physics, 1995, Vol.34 (10), p.5483-5488 [Periódico revisado por pares]

Tokyo: Japanese journal of applied physics

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10
A New Approach for Form Polycrystalline Silicon by Excimer Laser Irradiation with a Wide Range of Energies
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A New Approach for Form Polycrystalline Silicon by Excimer Laser Irradiation with a Wide Range of Energies

Hara, Akito ; Kitahara, Kuninori ; Nakajima, Kazuo ; Okabe, Masahiro

Japanese Journal of Applied Physics, 1999-12, Vol.38 (12R), p.6624 [Periódico revisado por pares]

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