Low-temperature PECVD deposition of highly conductive microcrystalline silicon thin films
Alexandre Mantovani Nardes Adnei Melges de Andrade 1943-; Fernando Josepetti Fonseca 1959-; Ely Antonio Tadeu Dirani; Reginaldo Muccillo; Eliana Navarro dos Santos Muccillo
Journal of Materials Science: materials in electronics London v.14, n. 5-7, p.407-411, May-Jul 2003
London 2003
Item não circula. Consulte sua biblioteca.(Acessar)