Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artículo
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Direct‐laser writing of silicon microstructures: Raman microprobe diagnostics and modeling of the nucleation phase of depositionHerman, Irving P. ; Magnotta, Frank ; Kotecki, David E.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-05, Vol.4 (3), p.659-664 [Revista revisada por pares]Texto completo disponible |
2 |
Material Type: Artículo
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Industrial Deposition of Binary, Ternary, and Quaternary Nitrides of Titanium, Zirconium, and AluminumKnotek, O ; Munz, W D ; Leyendecker, TJournal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-10, Vol.5 (4-IV), p.2173-2179 [Revista revisada por pares]Texto completo disponible |
3 |
Material Type: Artículo
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Titanium aluminum nitride films: A new alternative to TiN coatingsMünz, Wolf‐DieterJournal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-11, Vol.4 (6), p.2717-2725 [Revista revisada por pares]Texto completo disponible |
4 |
Material Type: Artículo
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On structure and properties of sputtered Ti and Al based hard compound filmsKnotek, O. ; Böhmer, M. ; Leyendecker, T.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-11, Vol.4 (6), p.2695-2700 [Revista revisada por pares]Texto completo disponible |
5 |
Material Type: Artículo
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Morphology and properties of sputtered (Ti,Al)N layers on high speed steel substrates as a function of deposition temperature and sputtering atmosphereJehn, Hermann A. ; Hofmann, Siegfried ; Rückborn, Vera‐Ellen ; Münz, Wolf‐DieterJournal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-11, Vol.4 (6), p.2701-2705 [Revista revisada por pares]Texto completo disponible |
6 |
Material Type: Artículo
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Material selection for hard coatingsHolleck, H.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-11, Vol.4 (6), p.2661-2669 [Revista revisada por pares]Texto completo disponible |
7 |
Material Type: Artículo
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Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminumKnotek, O. ; Münz, W. D. ; Leyendecker, T.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1987-07, Vol.5 (4), p.2173-2179 [Revista revisada por pares]Texto completo disponible |
8 |
Material Type: Artículo
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Comparison of M‐region x‐ray and Auger electron spectra for near‐threshold electron excitation of metallic and oxidized lanthanumWachter, Joseph R. ; Liefeld, Robert J.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1989-03, Vol.7 (2), p.249-252 [Revista revisada por pares]Texto completo disponible |
9 |
Material Type: Artículo
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Magnetron sputtered TiAlON composite thin films. I. Structure and morphologyLuthier, R. ; Lévy, F.Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1991-01, Vol.9 (1), p.102-109 [Revista revisada por pares]Melville, NY: American Institute of PhysicsTexto completo disponible |
10 |
Material Type: Artículo
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Deposition and properties of polycrystalline TiN/NbN superlattice coatingsChu, X. ; Wong, M. S. ; Sproul, W. D. ; Rohde, S. L. ; Barnett, S. A.Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1992-07, Vol.10 (4), p.1604-1609 [Revista revisada por pares]WOODBURY: Amer Inst PhysicsTexto completo disponible |