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1
Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness
Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness
Material Type:
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Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness

Maria Cecília Barbosa da Silveira Salvadori Mauro Sérgio Dorsa Cattani; F S Teixeira; R S Wiederkehr; I G Brown

Journal of Vacuum Science & Technology A v. 25, n. 2, p.330-333, 2007

New York 2007

Acesso online

2
Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness
Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness
Material Type:
Artigo 		Adicionar ao Meu Espaço

Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness

Maria Cecília Barbosa da Silveira Salvadori Mauro Sérgio Dorsa Cattani; F S Teixeira; R S Wiederkehr; I G Brown

Journal of Vacuum Science & Technology A v. 25, n. 2, p.330-333, 2007

New York 2007

Acesso online

3
Contamination due to memory effects in filtered vacuum arc plasma deposition systems
Contamination due to memory effects in filtered vacuum arc plasma deposition systems
Material Type:
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Contamination due to memory effects in filtered vacuum arc plasma deposition systems

Deilton Reis Martins Maria Cecília Barbosa da Silveira Salvadori; Patrick Bernard Verdonck 1958-; I G Brown

Applied Physics Letters New York v. 81, n. 11, p. 1969-1971, 2002

New York 2002

Acesso online

4
Contamination due to memory effects in filtered vacuum arc plasma deposition systems
Contamination due to memory effects in filtered vacuum arc plasma deposition systems
Material Type:
Artigo 		Adicionar ao Meu Espaço

Contamination due to memory effects in filtered vacuum arc plasma deposition systems

Deilton Reis Martins Maria Cecília Barbosa da Silveira Salvadori; Patrick Bernard Verdonck 1958-; I G Brown

Applied Physics Letters New York v. 81, n. 11, p. 1969-1971, 2002

New York 2002

Acesso online

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Autor/Criador 

  1. Martins, D  (2)
  2. Teixeira, F  (2)
  3. Wiederkehr, R  (2)
  4. Verdonck, P  (2)
  5. Cattani, M  (2)
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Deste Autor:

  1. Brown, I
  2. Salvadori, M
  3. Martins, D
  4. Teixeira, F
  5. Wiederkehr, R

Neste Assunto:

  1. Vácuo
  2. Filmes Finos
  3. Física De Plasmas

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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