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Surface chemistry of the iron tetraazamacrocycle on the aminopropyl-modified surface of oxidized n-Si(100) by AFM and XPS

Magalhães, Janildo L. ; Moreira, Leonardo M. ; Rodrigues-Filho, Ubirajara P. ; Giz, Martha J. ; Pereira-da-Silva, Marcelo A. ; Landers, Richard ; Vinhas, Rita C. G. ; Nascente, Pedro A. P.

Surface and interface analysis, 2002-04, Vol.33 (4), p.293-298 [Periódico revisado por pares]

Chichester, UK: John Wiley & Sons, Ltd

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  • Título:
    Surface chemistry of the iron tetraazamacrocycle on the aminopropyl-modified surface of oxidized n-Si(100) by AFM and XPS
  • Autor: Magalhães, Janildo L. ; Moreira, Leonardo M. ; Rodrigues-Filho, Ubirajara P. ; Giz, Martha J. ; Pereira-da-Silva, Marcelo A. ; Landers, Richard ; Vinhas, Rita C. G. ; Nascente, Pedro A. P.
  • Assuntos: 3-aminopropyltrimethoxysilane thin films ; AFM ; Chemistry ; Exact sciences and technology ; General and physical chemistry ; iron tetraazamacrocycle ; silicon dioxide ; Solid-gas interface ; Surface physical chemistry ; TIM ; XPS
  • É parte de: Surface and interface analysis, 2002-04, Vol.33 (4), p.293-298
  • Notas: Fundação de Amparo a Pesquisa do Estado de São Paulo (FAPESP) - No. 1998/15062-0.
    istex:71C677A1F0B8B2072D67D76785C41C49B6DA4071
    Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES).
    Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq).
    ark:/67375/WNG-DZ3FT5B3-V
    ArticleID:SIA1186
  • Descrição: The structure and formation mechanisms of 3‐aminopropyltrimethoxysilane (3‐APTS) films deposited on wet‐chemically grown silicon dioxide over n‐Si(100) wafer have been examined systematically using x‐ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The asymmetric N 1s XPS spectrum for the anchored 3‐APTS was fitted for –NH2 (399.6 ± 0.3 eV) and –NH3+ (401.1 ± 0.3 eV). Rougher surfaces are obtained by deposition from toluene solutions than from the gaseous phase. Over the 3‐APTS layer was deposited the [FeTIM(CH3CN)2]2+ complex, where TIM is 2,3,9,10‐tetramethyl‐1,4,8,11‐tetraazacyclotetradeca‐1,3,8,10‐tetraene. The adsorption occurs by acetonitrile replacement for the–NH2‐grafted group with the equatorial plane parallel to the organomodified surface. Once FeTIM can bind a CO, NO or N‐heterocycle, a built‐on Si wafer sensor device could be envisaged for these molecules. Copyright © 2002 John Wiley & Sons, Ltd.
  • Editor: Chichester, UK: John Wiley & Sons, Ltd
  • Idioma: Inglês
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  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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