193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers

Varanasi, Pushkara R ; Kwong, Ranee W ; Khojasteh, Mahmoud ; Patel, Kaushal ; Chen, Kuang-Jung ; Li, Wenjie ; Lawson, M. C ; Allen, Robert D ; Sooriyakumaran, Ratnam ; Brock, P ; Sundberg, Linda K ; Slezak, Mark ; Dabbagh, Gary ; Liu, Z ; Nishimura, Yukio ; Chiba, Takashi ; Shimokawa, Tsutomu

Proc. SPIE, 2005, Vol.5753, p.131-139

Bellingham WA: SPIE

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