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A POROUS SUBSTRATE RESISTOR AIMED AT MINIATURIZATION OF METAL-FILM RESISTORS

MATLEY,T ; Gross,P. M

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Título:
A POROUS SUBSTRATE RESISTOR AIMED AT MINIATURIZATION OF METAL-FILM RESISTORS
Autor: MATLEY,T ; Gross,P. M
Assuntos: BRAZING ; ELECTRIC TERMINALS ; ELECTRICAL RESISTANCE ; EPOXY RESINS ; METAL COATINGS ; METAL FILMS ; MICROELECTRONICS ; PENETRATION ; POROUS MATERIALS ; RESISTORS ; VACUUM APPARATUS ; VAPOR PLATING
Notas: DTIC AND NTIS
Descrição: A ratio parameter has been defined as the length resistance divided by the width resistance. This parameter clearly provides enough information to evaluate terminals when substrate quality and metallizing are controlled. Additional information regarding terminal quality is provided by the % standard deviation in resistance under similar circumstances. Various types of brazed terminals have been evaluated accordingly. It has been determined that a high quality type of brazed terminal still prevents satisfactory metallization. A terminal which can be supplied after heat treatment must be employed and vacuum metallizing may be required in spite of large lot-to-lot variations in resistance. (Author) See also AD-621 748.
Data de criação/publicação: 1965
Idioma: Inglês

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