SU-8 etching in inductively coupled oxygen plasma

Rasmussen, Kristian Hagsted ; Keller, Stephan Sylvest ; Jensen, Flemming ; Jorgensen, Anders Michael ; Hansen, Ole

Microelectronic engineering, 2013-12, Vol.112, p.35-40 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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