skip to main content
Idioma:

Charge Compensation by Iodine Covalent Bonding in Lead Iodide Perovskite Materials

Ruth, Anthony ; Holland, Michael ; Rockett, Angus ; Sanehira, Erin ; Irwin, Michael D. ; Steirer, K. Xerxes

Crystals (Basel), 2022-01, Vol.12 (1) [Periódico revisado por pares]

United States: MDPI

Texto completo disponível

Citações Citado por
  • Título:
    Charge Compensation by Iodine Covalent Bonding in Lead Iodide Perovskite Materials
  • Autor: Ruth, Anthony ; Holland, Michael ; Rockett, Angus ; Sanehira, Erin ; Irwin, Michael D. ; Steirer, K. Xerxes
  • Assuntos: Crystallography ; Materials Science
  • É parte de: Crystals (Basel), 2022-01, Vol.12 (1)
  • Notas: USDOE Office of Energy Efficiency and Renewable Energy (EERE)
    EE0008540
  • Descrição: Metal halide perovskite materials (MHPs) are a family of next-generation semiconductors that are enabling low-cost, high-performance solar cells and optoelectronic devices. The most-used halogen in MHPs, iodine, can supplement its octet by covalent bonding resulting in atomic charges intermediate to I− and I0. Here, we examine theoretically stabilized defects of iodine using density functional theory (DFT); defect formation enthalpies and iodine Bader charges which illustrate how MHPs adapt to stoichiometry changes. Experimentally, X-ray photoelectron spectroscopy (XPS) is used to identify perovskite defects and their relative binding energies, and validate the predicted chemical environments of iodine defects. Examining MHP samples with excess iodine compared with near stoichiometric samples, we discern additional spectral intensity in the I 3d5/2 XPS data arising from defects, and support the presence of iodine trimers. I 3d5/2 defect peak areas reveal a ratio of 2:1, matching the number of atoms at the ends and middle of the trimer, whereas their binding energies agree with calculated Bader charges. Results suggest the iodine trimer is the preferred structural motif for incorporation of excess iodine into the perovskite lattice. Understanding these easily formed photoactive defects and how to identify their presence is essential for stabilizing MHPs against photodecomposition.
  • Editor: United States: MDPI
  • Idioma: Inglês
Links
Voltar para lista de resultados

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

Buscando em bases de dados remotas. Favor aguardar.