Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process
Aarik, Jaan ; Aidla, Aleks ; Uustare, Teet ; Ritala, Mikko ; Leskelä, Markku
Applied surface science, 2000-07, Vol.161 (3), p.385-395 [Periódico revisado por pares]Amsterdam: Elsevier B.V
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