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Influence des paramètres puissance source et bias sur la gravure ICP-RIE plasma d’une couche mince suivie par interférométrie LASER

Constantin, D. ; Petit-Etienne, C. ; Bsiesy, A.

Journal sur l'enseignement des sciences et technologies de l'information et des systèmes, 2022, Vol.21, p.1003 [Peer Reviewed Journal]

EDP Sciences

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