Isotopic labeling study of oxygen diffusion in amorphous LaScO3 high-κ films on Si(100) and its effects on the electrical characteristics

Lopes, J. M. J. ; Littmark, U. ; Roeckerath, M. ; Durǧun Özben, E. ; Lenk, S. ; Breuer, U. ; Besmehn, A. ; Stärk, A. ; Grande, P. L. ; Sortica, M. A. ; Radtke, C. ; Schubert, J. ; Mantl, S.

Applied physics. A, Materials science & processing, 2009-08, Vol.96 (2), p.447-451 [Periódico revisado por pares]

Berlin/Heidelberg: Springer-Verlag

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