Dielectric behavior of O2/CF4 plasma etched polyimide exposed to humid environments

Wu, Shien‐Yang ; Denton, Denice D. ; De Souza‐Machado, Ressano

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1993-03, Vol.11 (2), p.291-300 [Periódico revisado por pares]

Melville, NY: American Institute of Physics

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