Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering

PEDERSEN, K ; BØTTIGER, J ; SRIDHARAN, M ; SILLASSEN, M ; EKLUND, P

Thin solid films, 2010-05, Vol.518 (15), p.4294-4298 [Periódico revisado por pares]

Amsterdam: Elsevier

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