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Multilayer and Thin Film Analysis Using FPMulti Software

Bekkers, M. H. J. ; van Sprang, H. A.

X-ray spectrometry, 1997-05, Vol.26 (3), p.122-124 [Periódico revisado por pares]

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Título:
Multilayer and Thin Film Analysis Using FPMulti Software
Autor: Bekkers, M. H. J. ; van Sprang, H. A.
Assuntos: Analytical chemistry ; Chemistry ; Computers in experimental physics ; Data analysis: algorithms and implementation; data management ; Exact sciences and technology ; Instruments, apparatus, components and techniques common to several branches of physics and astronomy ; Physics ; Spectrometric and optical methods
É parte de: X-ray spectrometry, 1997-05, Vol.26 (3), p.122-124
Notas: ArticleID:XRS220
ark:/67375/WNG-Q5XZCR2X-3
istex:E38319F80A51BF9B5003EBEF301FB259E35F5F30
Descrição: X‐ray spectrometry combined with a fundamental parameter package can be used to obtain semiquantitative analytical results for thin layered samples. This paper explores the use of the program FPMulti for various applications. These applications are examples of how accurate this program is for multilayer and thin film analysis. After a short description of the analytical method, the range of applications is given with which the authors have experience. In the experimental section three applications are described in more detail: (i) an example to show the accuracy of the method, (ii) an example of the calculation of the layer thickness and (iii) the possibility of quantifying oxygen in 3d metal oxides. © 1997 by John Wiley & Sons, Ltd.
Editor: Chichester, UK: John Wiley & Sons, Ltd
Idioma: Inglês

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