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Mask technologies for metastable atom lithography: photomask and physical mask

Ju, Xin ; Kurahashi, Mitsunori ; Suzuki, Taku ; Yamauchi, Yasushi

Proceedings of SPIE, 2003, Vol.5130, p.1055-1058

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Título:
Mask technologies for metastable atom lithography: photomask and physical mask
Autor: Ju, Xin ; Kurahashi, Mitsunori ; Suzuki, Taku ; Yamauchi, Yasushi
Assuntos: Applied sciences ; Electronics ; Exact sciences and technology ; Microelectronic fabrication (materials and surfaces technology) ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
É parte de: Proceedings of SPIE, 2003, Vol.5130, p.1055-1058
Notas: Conference Location: Yokohama, Japan
Conference Date: 2003-04-16|2003-04-18
SourceType-Scholarly Journals-2
ObjectType-Feature-2
ObjectType-Conference Paper-1
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SourceType-Conference Papers & Proceedings-1
ObjectType-Article-3
Descrição: Using TEM copper grid with different pitch size as physical mask, alkanethiolates self-assembled monolayers was patterned by a metastable helium atom beam, demonstrating pattern transfer with nanoscale edge width to the underlying gold film. We found that the mask was reproduced as positive- or negative patterns with high fidelity, and the repetition of lithographic patterns was good in different runs.
Editor: Bellingham WA: SPIE
Idioma: Inglês

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