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Optical characterization of CN sub(x) thin films deposited by reactive pulsed laser ablation

Zocco, A ; Perrone, A ; Luches, A ; Rella, R ; Klini, A ; Zergioti, I ; Fotakis, C

Thin solid films, 1999-01, Vol.349 (1), p.100-104 [Periódico revisado por pares]

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Título:
Optical characterization of CN sub(x) thin films deposited by reactive pulsed laser ablation
Autor: Zocco, A ; Perrone, A ; Luches, A ; Rella, R ; Klini, A ; Zergioti, I ; Fotakis, C
É parte de: Thin solid films, 1999-01, Vol.349 (1), p.100-104
Notas: ObjectType-Article-2
SourceType-Scholarly Journals-1
content type line 23
ObjectType-Feature-1
Descrição: Optical absorption measurements on CN sub(x) thin films produced by reactive pulsed laser ablation (RPLA) at different pressures of nitrogen in the growth chamber were performed. The influence of growth regime on optical properties (n,k) of the CN sub(x) films has been examined with IR and UV-VIS spectroscopy. The dependence of the absorption coefficient alpha on the photon energy h-bar omega at the edge of the absorption band is well described by the relation alpha h-bar omega identical with B( h-bar omega -E sub(opt)) super(2) indicating the presence of allowed indirect transitions in the 0.8-3.0 eV photon energy range. Furthermore, we observed a decrease in the optical gap values with increasing N concentration in the deposited films. Fourier transform infrared (FTIR) spectra were also employed to analyze the chemical bonding state between the different species present in the films.
Idioma: Inglês

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