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Microfluidic etching driven by capillary forces for rapid prototyping of gold structures

Stark, R.W. ; Sakai Stalder, M. ; Stemmer, A.

Microelectronic engineering, 2003-06, Vol.67, p.229-236 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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  • Título:
    Microfluidic etching driven by capillary forces for rapid prototyping of gold structures
  • Autor: Stark, R.W. ; Sakai Stalder, M. ; Stemmer, A.
  • Assuntos: Applied sciences ; Electronics ; Exact sciences and technology ; Microelectronic fabrication (materials and surfaces technology) ; Microfluidic etching ; Rapid prototyping ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Soft lithography
  • É parte de: Microelectronic engineering, 2003-06, Vol.67, p.229-236
  • Notas: SourceType-Scholarly Journals-2
    ObjectType-Feature-2
    ObjectType-Conference Paper-1
    content type line 23
    SourceType-Conference Papers & Proceedings-1
    ObjectType-Article-3
  • Descrição: Soft lithographic methods based on poly(dimethylsiloxane) (PDMS) for pattern transfer are established alternatives to conventional lithographic methods. For applications in the biological sciences functionalized and structured noble metal surfaces are required. In order to allow for rapid prototyping of such gold structures a method is needed that does not change the surface chemistry. This can be achieved by a microfluidic system on a gold substrate that is filled with an etchant. From theoretical considerations simple thumb rules for the geometric and chemical design of such a microfluidic system were established. For experimental testing a microfluidic system was realized by contacting a structured PDMS stamp with a substrate consisting of a 50-nm-thick gold layer on a glass object slide. The etchant was applied to the entrance of the capillary and the acid was drawn into the fluidic system by capillary forces. Taking advantage of a PDMS stamp structured with wetting and non-wetting regions no additional self-assembled monolayer was needed for masking.
  • Editor: Amsterdam: Elsevier B.V
  • Idioma: Inglês
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