Selective etching of silicon nitride over silicon oxide using ClF3/H2 remote plasma

Lee, Won Oh ; Kim, Ki Hyun ; Kim, Doo San ; Ji, You Jin ; Kang, Ji Eun ; Tak, Hyun Woo ; Park, Jin Woo ; Song, Han Dock ; Kim, Ki Seok ; Cho, Byeong Ok ; Kim, Young Lae ; Yeom, Geun Young

Scientific reports, 2022-04, Vol.12 (1), p.5703-5703, Article 5703 [Periódico revisado por pares]

London: Nature Publishing Group

Texto completo disponível