Depth profiles of aluminum component in sequential infiltration synthesis-treated electron beam resist films analyzed by time-of-flight secondary ion mass spectrometry

Ito, Shunya ; Ozaki, Yuki ; Nakamura, Takahiro ; Nakagawa, Masaru

Japanese Journal of Applied Physics, 2020-06, Vol.59 (SI), p.SIIC03 [Periódico revisado por pares]

IOP Publishing

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