Two-Dimensional Pattern Formation Using Graphoepitaxy of PS‑b‑PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

Tsai, Hsinyu ; Pitera, Jed W ; Miyazoe, Hiroyuki ; Bangsaruntip, Sarunya ; Engelmann, Sebastian U ; Liu, Chi-Chun ; Cheng, Joy Y ; Bucchignano, James J ; Klaus, David P ; Joseph, Eric A ; Sanders, Daniel P ; Colburn, Matthew E ; Guillorn, Michael A

ACS nano, 2014-05, Vol.8 (5), p.5227-5232 [Periódico revisado por pares]

United States: American Chemical Society

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