skip to main content
Idioma:
Tipo de recurso Mostra resultados com: Mostra resultados com: Índice

Fabrication of Silicon Nanobelts and Nanopillars by Soft Lithography for Hydrophobic and Hydrophilic Photonic Surfaces

Baquedano, Estela ; Martinez, Ramses V ; Llorens, José M ; Postigo, Pablo A

Nanomaterials (Basel, Switzerland), 2017-05, Vol.7 (5), p.109 [Periódico revisado por pares]

Switzerland: MDPI AG

Texto completo disponível

Citações Citado por
  • Título:
    Fabrication of Silicon Nanobelts and Nanopillars by Soft Lithography for Hydrophobic and Hydrophilic Photonic Surfaces
  • Autor: Baquedano, Estela ; Martinez, Ramses V ; Llorens, José M ; Postigo, Pablo A
  • Assuntos: Absorption ; Aspect ratio ; Contact angle ; Etching ; Fabrication ; Hydrophobicity ; Ion etching ; Lithography ; Nanotechnology ; Patterning ; Peptides ; Photonics ; Physical properties ; Polymethyl methacrylate ; Polymethylmethacrylate ; Reactive ion etching ; Reflectance ; Silicon ; Spectra ; Surface chemistry ; Ultraviolet ; Wettability
  • É parte de: Nanomaterials (Basel, Switzerland), 2017-05, Vol.7 (5), p.109
  • Descrição: Soft lithography allows for the simple and low-cost fabrication of nanopatterns with different shapes and sizes over large areas. However, the resolution and the aspect ratio of the nanostructures fabricated by soft lithography are limited by the depth and the physical properties of the stamp. In this work, silicon nanobelts and nanostructures were achieved by combining soft nanolithography patterning with optimized reactive ion etching (RIE) in silicon. Using polymethylmethacrylate (PMMA) nanopatterned layers with thicknesses ranging between 14 and 50 nm, we obtained silicon nanobelts in areas of square centimeters with aspect ratios up to ~1.6 and linewidths of 225 nm. The soft lithographic process was assisted by a thin film of SiO (less than 15 nm) used as a hard mask and RIE. This simple patterning method was also used to fabricate 2D nanostructures (nanopillars) with aspect ratios of ~2.7 and diameters of ~200 nm. We demonstrate that large areas patterned with silicon nanobelts exhibit a high reflectivity peak in the ultraviolet C (UVC) spectral region (280 nm) where some aminoacids and peptides have a strong absorption. We also demonstrated how to tailor the aspect ratio and the wettability of these photonic surfaces (contact angles ranging from 8.1 to 96.2°) by changing the RIE power applied during the fabrication process.
  • Editor: Switzerland: MDPI AG
  • Idioma: Inglês
Links
Voltar para lista de resultados

  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

Buscando em bases de dados remotas. Favor aguardar.