Characterization by coulometric reduction of surface chemical components formed on copper in fluorine-containing plasmas
Hugo Antonio Vilca Meléndez Ronaldo Ruas; Patrick Bernard Verdonck 1958-; Idalina Vieira Aoki 1955-
Electrochemical and Solid State Letters Pennington v. 6, n. 12, p. B55-B58Pennington 2003
Item não circula. Consulte sua biblioteca.(Acessar)