Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic field
Ueda, M. ; Tan, I.H. ; Dallaqua, R.S. ; Rossi, J.O.
Surface & coatings technology, 2007-04, Vol.201 (15), p.6597-6600
[Periódico revisado por pares]
Lausanne: Elsevier B.V
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