Deposition of silicon nitride thin films by hot-wire CVD at 100 °C and 250 °C
Alpuim, P. ; Gonçalves, L.M. ; Marins, E.S. ; Viseu, T.M.R. ; Ferdov, S. ; Bourée, J.E.
Thin solid films, 2009-04, Vol.517 (12), p.3503-3506
[Periódico revisado por pares]
Amsterdam: Elsevier B.V
Texto completo disponível