Solution Mask Liquid Lithography (SMaLL) for One‐Step, Multimaterial 3D Printing

Dolinski, Neil D. ; Page, Zachariah A. ; Callaway, E. Benjamin ; Eisenreich, Fabian ; Garcia, Ronnie V. ; Chavez, Roberto ; Bothman, David P. ; Hecht, Stefan ; Zok, Frank W. ; Hawker, Craig J.

Advanced materials (Weinheim), 2018-08, Vol.30 (31), p.e1800364-n/a [Periódico revisado por pares]

Germany: Wiley Subscription Services, Inc

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