Photoreflectance measurements on 'SI' 'DELTA'-doped 'GA''AS' samples grown by molecular-beam epitaxy
A A Bernussi F Iikawa; P Motisuke; Pierre Basmaji; Máximo Siu Li; Oscar Hipólito
New York v.67, n.9 , p.4149-51, mai. 1990 Journal of Applied PhysicsNew York 1990
Localização: IFSC - Inst. Física de São Carlos (PROD000861 )(Acessar)
- 0
- 1
- 2
- 3
- 4
- 5
- 6
- 7
- 8
- 9
- 10
- 11
- 12
- 13
- 14
- 15
- 16
- 17
- 18
- 19
- 20
- 21
- 22
- 23
- 24
- 25
- 26
- 27
- 28
- 29
- 30
- 31
- 32
- 33
- 34
- 35
- 36
- 37
prod000871
prod000847@1
browse_callnumber
display.do?gathStatTab=true&dscnt=0&callNumberBrowseField=browse_callnumber&tabRealType=browseshelf&mode=Advanced&vid=USP&rfnGrp=1&rfnGrp=2&tab=usp_fisico&dstmp=1722228163822&rfnGrpCounter=1&fctV=Hip%C3%B3lito%2C+O&fctV=Mat%C3%A9ria+Condensada&callNumber=prod000861&fctN=facet_creator&fctN=facet_topic&vl(freeText0)=Siu%20Li%2C%20M&ct=display&fn=search&indx=6&recIdxs=0&elementId=0