Influence of Massively Parallel E-Beam Direct Write Pixel Size on Electron Proximity Correction

LIN, S. J ; CHEN, P. S ; SHIN, J. J ; WANG, W. C ; LIN, Burn J

Proceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.7970

Bellingham WA: SPIE

Texto completo disponível