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High red emission intensity of Eu:Y2O3 films grown on Si(100)/Si(111) by electron beam evaporation

Rivera, V.A.G. ; Ferri, F.A. ; Clabel H., J.L. ; Pereira-da-Silva, M.A. ; Nunes, L.A.O. ; Li, M. Siu ; Marega, E.

Journal of luminescence, 2014-04, Vol.148, p.186-191 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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Título:
High red emission intensity of Eu:Y2O3 films grown on Si(100)/Si(111) by electron beam evaporation
Autor: Rivera, V.A.G. ; Ferri, F.A. ; Clabel H., J.L. ; Pereira-da-Silva, M.A. ; Nunes, L.A.O. ; Li, M. Siu ; Marega, E.
Assuntos: Annealing ; Cold working, work hardening; annealing, quenching, tempering, recovery, and recrystallization; textures ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Deposition ; Electron beams ; Emission ; Emission analysis ; Evaporation ; Exact sciences and technology ; Magnetic dipoles ; Materials ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Molecular, atomic, ion, and chemical beam epitaxy ; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation ; Photoluminescence ; Physics ; Rare-earths ; Reduction ; Spectroscopy ; Thin films ; Treatment of materials and its effects on microstructure and properties
É parte de: Journal of luminescence, 2014-04, Vol.148, p.186-191
Notas: ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
Descrição: High red photoluminescence emission has been obtained at room temperature in Eu3+-doped yttrium oxide thin films following thermal treatment. Films with different thicknesses were deposited on Si(100) and Si(111) substrates via electron beam evaporation in a vacuum environment. The films were subsequently annealed in an oxygen atmosphere for 5h at 900°C. The structural and optical properties of the films were measured before and after annealing. An improvement in the emission intensity was observed as a result of the thermal treatment under a controlled atmosphere. This observation is related to the reduction of non-radiative processes, as verified by the enhancement of the 5D0→7F2 lifetime values. This improvement in the emission intensity was also analyzed in terms of electric and magnetic dipole transitions (5D0→7F2 and 5D0→7F1 level transitions, respectively). Both transitions are directly related to the site symmetry and, consequently, to the crystalline structure of the films deposited on the Si(100)/Si(111) substrates. •We compare the optical and structural properties of Eu:Y2O3.•Thermal treatment in an oxygen atmosphere produces an improvement in luminescence.•Increased lifetime values were observed after annealing.
Editor: Amsterdam: Elsevier B.V
Idioma: Inglês

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High red emission intensity of Eu:Y2O3 films grown on Si(100)/Si(111) by electron beam evaporation

Rivera, V.A.G. ; Ferri, F.A. ; Clabel H., J.L. ; Pereira-da-Silva, M.A. ; Nunes, L.A.O. ; Li, M. Siu ; Marega, E.

Amsterdam: Elsevier B.V

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