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STRUCTURAL AND OPTICAL PROPERTIES OF ZnO EPITAXIAL FILMS GROWN ON Al2O3 (11-20) SUBSTRATES BY METALORGANIC CHEMICAL VAPOR DEPOSITION

Binh, N T ; Zhang, B-P ; Liu, C-Y ; Wakatsuki, K ; Segawa, Y ; Usami, N

Jpn.J.Appl.Phys ,Part 1. Vol. 43, no. 7A, pp. 4110-4113. 2004, 2004-01, Vol.43 (7A), p.4110-4113 [Periódico revisado por pares]

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Título:
STRUCTURAL AND OPTICAL PROPERTIES OF ZnO EPITAXIAL FILMS GROWN ON Al2O3 (11-20) SUBSTRATES BY METALORGANIC CHEMICAL VAPOR DEPOSITION
Autor: Binh, N T ; Zhang, B-P ; Liu, C-Y ; Wakatsuki, K ; Segawa, Y ; Usami, N
É parte de: Jpn.J.Appl.Phys ,Part 1. Vol. 43, no. 7A, pp. 4110-4113. 2004, 2004-01, Vol.43 (7A), p.4110-4113
Notas: ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
Descrição: ZnO films of different thicknesses were grown on Al2O3 (11-20) substrates by metalorganic chemical vapor deposition. Characterizations using X-ray diffraction and scanning electron microscopy demonstrated the transition from two-dimensional growth to three-dimensional growth with an increase in film thickness. Photoluminescence spectra revealed the thickness dependence of the exciton peak and a stimulated emission due to exciton-exciton scattering was observed. 19 refs.
Idioma: Inglês

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