Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation

Talitha Nicoletti Sara Dereste dos Santos; João Antonio Martino 1959-; Marc Aoulaiche; Anabela Veloso; Cor Claeys; Eddy Simoen; Malgorzata Jurczak

Solid-State Electronics v. 91, p. 53-58, Jan 2014

2014

Item não circula. Consulte sua biblioteca.(Acessar)