Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom)
Marcos Massi Ronaldo Domingues Mansano 1964-; Homero Santiago Maciel; Patrick Bernard Verdonck 1958-; Conference of the Brazilian Microelectronics Society (12. 1997 Caxambu)
Proceedings Itajubá : SBMICRO/EFEI, 1997Itajubá SBMICRO/EFEI 1997
Item não circula. Consulte sua biblioteca.(Acessar)