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Surface termination and hydrogen bubble adhesion on Si(1 0 0) surfaces during anisotropic dissolution in aqueous KOH

Haiss, Wolfgang ; Raisch, Philipp ; Bitsch, Lennart ; Nichols, Richard J. ; Xia, Xinghua ; Kelly, John J. ; Schiffrin, David J.

Journal of electroanalytical chemistry (Lausanne, Switzerland), 2006-11, Vol.597 (1), p.1-12 [Peer Reviewed Journal]

Amsterdam: Elsevier B.V

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