Reactive ion etching of Ge-Sb-Se ternary chalcogenide glass films in fluorine plasma
Xiong, Hao ; Shi, Yunfan ; Wang, Zheyao
Microelectronic engineering, 2020-03, Vol.225, p.111259, Article 111259
[Periódico revisado por pares]
Amsterdam: Elsevier B.V
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