Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma

Li, D. ; Carette, M. ; Granier, A. ; Landesman, J.P. ; Goullet, A.

Thin solid films, 2012-11, Vol.522, p.366-371 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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